英文缩写 |
“PECVD”是“Plasma Enhanced Chemical Vapor Deposition”的缩写,意思是“等离子体增强化学气相沉积” |
释义 |
英语缩略词“PECVD”经常作为“Plasma Enhanced Chemical Vapor Deposition”的缩写来使用,中文表示:“等离子体增强化学气相沉积”。本文将详细介绍英语缩写词PECVD所代表英文单词,其对应的中文拼音、详细解释以及在英语中的流行度。此外,还有关于缩略词PECVD的分类、应用领域及相关应用示例等。 “PECVD”(“等离子体增强化学气相沉积)释义 - 英文缩写词:PECVD
- 英文单词:Plasma Enhanced Chemical Vapor Deposition
- 缩写词中文简要解释:等离子体增强化学气相沉积
- 中文拼音:děng lí zǐ tǐ zēng qiáng huà xué qì xiāng chén jī
- 缩写词流行度:19020
- 缩写词分类:Academic & Science
- 缩写词领域:Electronics
以上为Plasma Enhanced Chemical Vapor Deposition英文缩略词PECVD的中文解释,以及该英文缩写在英语的流行度、分类和应用领域方面的信息。
英文缩略词PECVD的扩展资料-
The structure of microcrystalline silicon thin film solar cells prepared by very high frequency plasma enhanced chemical vapor deposition, is studied.
对甚高频等离子体增强化学气相沉积(PECVD)技术制备的微晶硅薄膜太阳电池进行了研究。
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A new plasma diagnostic system with Langmuir probe is designed to measure the plasma parameters in a plasma enhanced chemical vapor deposition ( PECVD ) vacuum coating machine.
开发了一个朗缪尔探针等离子体诊断系统对PECVD真空镀膜机进行了等离子体参数诊断。
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Different structural silicon thin films deposited by very high frequency plasma enhanced chemical vapor deposition ( VHF-PECVD ) were studied at the use of purifier or not.
本文采用VHFPECVD技术制备了不同结构的硅薄膜,分析研究了有、无纯化器对制备薄膜特性的影响。
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A series of microcrystalline silicon thin films were fabricated by very high frequency plasma enhanced chemical vapor deposition ( VHF-PECVD ) at different silane concentrations in a P chamber.
在掺杂P室采用甚高频等离子体增强化学气相沉积(PECVD)(VHF-PECVD)技术,制备了不同硅烷浓度条件下的本征微晶硅薄膜。
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Porous silica films were prepared on the glass substrate by plasma enhanced chemical vapor deposition ( PECVD ) system modulated by pulse negative bias voltage and silane as precursor gas.
采用由脉冲负偏压调节的等离子体增强化学气相沉积(PECVD)方法,以硅烷为源气体,在玻璃基片上沉积得到了多孔二氧化硅薄膜。
上述内容是“Plasma Enhanced Chemical Vapor Deposition”作为“PECVD”的缩写,解释为“等离子体增强化学气相沉积”时的信息,以及英语缩略词PECVD所代表的英文单词,其对应的中文拼音、详细解释以及在英语中的流行度和相关分类、应用领域及应用示例等。
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